Invention Grant
- Patent Title: X-ray sources using linear accumulation
- Patent Title (中): X射线源使用线性积分
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Application No.: US14999147Application Date: 2016-04-01
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Publication No.: US09543109B2Publication Date: 2017-01-10
- Inventor: Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon
- Applicant: Sigray, Inc.
- Applicant Address: US CA Concord
- Assignee: Sigray, Inc.
- Current Assignee: Sigray, Inc.
- Current Assignee Address: US CA Concord
- Agent Franklin Schellenberg
- Main IPC: H01J35/08
- IPC: H01J35/08 ; H01J35/10 ; H01J35/18 ; H01J35/14 ; G21K1/06

Abstract:
A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.
Public/Granted literature
- US20160268094A1 X-ray sources using linear accumulation Public/Granted day:2016-09-15
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