Invention Grant
- Patent Title: Multi charged particle beam writing apparatus and method for correcting a current distribution of groups of charged particle beams
- Patent Title (中): 一种多带电粒子束写入装置和用于校正带电粒子束组的电流分布的方法
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Application No.: US14700418Application Date: 2015-04-30
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Publication No.: US09543119B2Publication Date: 2017-01-10
- Inventor: Hiroshi Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-065386 20120322
- Main IPC: A61N5/00
- IPC: A61N5/00 ; H01J37/317

Abstract:
A multi charged particle beam writing apparatus of the present invention includes an aperture member to form multiple beams, a plurality of first deflectors to respectively perform blanking deflection of a corresponding beam, a second deflector to collectively deflect the multiple beams having passed through the plurality of openings of the aperture member so that the multiple beams do not reach the target object, a blanking aperture member to block each beam that has been deflected to be in the off state by the plurality of first deflectors, and a current detector, arranged at the blanking aperture member, to detect a current value of all beams in the on state in the multiple beams that have been deflected by the second deflector.
Public/Granted literature
- US20150235807A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2015-08-20
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