Invention Grant
- Patent Title: Vapor deposition of chalcogenide-containing films
- Patent Title (中): 含硫属化物的膜的气相沉积
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Application No.: US14587833Application Date: 2014-12-31
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Publication No.: US09543144B2Publication Date: 2017-01-10
- Inventor: Hana Ishii , Nathanaelle Schneider , Julien Gatineau
- Applicant: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- Main IPC: C23C16/30
- IPC: C23C16/30 ; H01L21/02 ; C23C16/455
Abstract:
Chalcogenide-containing film forming compositions, methods of synthesizing the same, and methods of forming Chalcogenide-containing films on one or more substrates via vapor deposition processes using the Chalcogenide-containing film forming compositions are disclosed.
Public/Granted literature
- US20150111392A1 CHALCOGENIDE-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF CHALCOGENIDE-CONTAINING FILMS Public/Granted day:2015-04-23
Information query
IPC分类:
