Invention Grant
US09543173B2 Decapsulator with applied voltage and etchant cooling system for etching plastic-encapsulated devices
有权
具有施加电压的解封装器和蚀刻塑料封装器件的蚀刻剂冷却系统
- Patent Title: Decapsulator with applied voltage and etchant cooling system for etching plastic-encapsulated devices
- Patent Title (中): 具有施加电压的解封装器和蚀刻塑料封装器件的蚀刻剂冷却系统
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Application No.: US13896207Application Date: 2013-05-16
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Publication No.: US09543173B2Publication Date: 2017-01-10
- Inventor: Alan M. Wagner
- Applicant: Nisene Technology Group
- Applicant Address: US CA Watsonville
- Assignee: Nisene Technology Group
- Current Assignee: Nisene Technology Group
- Current Assignee Address: US CA Watsonville
- Agency: Van Pelt, Yi & James LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/311 ; H01L21/56

Abstract:
An apparatus and a method for selectively etching an encapsulant forming a package of resinous material around an electronic device includes an electronic device package mountable on the etch head; a conductive electrode in electrical contact with package leads of the electronic device package to apply a first voltage to the package leads of the electronic device; a first pump configured to pump a first quantity of the etchant solution from the source into the etch head where the etchant solution is electrically biased to a second voltage different from the first voltage and is cooled to a temperature below the ambient temperature. An etch cavity is formed on an exterior surface of the electronic device package. When the etchant solution has etched through an exterior surface of the electronic device package, the conductive bond wires of the electronic device is prevented from being etched by the applied first voltage.
Public/Granted literature
- US20140342572A1 DECAPSULATOR WITH APPLIED VOLTAGE AND ETCHANT COOLING SYSTEM FOR ETCHING PLASTIC-ENCAPSULATED DEVICES Public/Granted day:2014-11-20
Information query
IPC分类: