Invention Grant
US09543183B2 Heated electrostatic chuck and semiconductor wafer heater and methods for manufacturing same 有权
加热静电卡盘和半导体晶片加热器及其制造方法

Heated electrostatic chuck and semiconductor wafer heater and methods for manufacturing same
Abstract:
A heated electrostatic chuck is provided, including a base having an upper surface and peripheral side surfaces, a thermal barrier coating formed by plasma deposition directly on at least the upper surface of the base, at least one heating element formed on portions of the thermal barrier coating, an electrically insulating layer formed on the heating element and exposed portions of the thermal barrier coating, at least one chucking electrode formed on at least a portion of the electrically insulating layer, and a protective layer formed on the chucking electrode.
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