Invention Grant
- Patent Title: Semiconductor apparatus and method for producing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US14412778Application Date: 2012-07-11
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Publication No.: US09543252B2Publication Date: 2017-01-10
- Inventor: Mamoru Terai , Shiori Idaka , Kei Yamamoto , Yoshiyuki Nakaki
- Applicant: Mamoru Terai , Shiori Idaka , Kei Yamamoto , Yoshiyuki Nakaki
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/JP2012/004470 WO 20120711
- International Announcement: WO2014/009996 WO 20140116
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/495 ; H01L23/29 ; H01L23/373 ; H01L21/56 ; H01L21/78 ; H01L29/16 ; H01L23/31 ; H01L23/433 ; H01L25/07

Abstract:
A plurality of semiconductor devices provided on a silicon carbide substrate are provided with electrode layers, respectively. The silicon carbide substrate is cut at a region of an exposed surface of the silicon carbide substrate that separates the electrode layers to individually separate the semiconductor devices. A stress relaxation resin is applied to each individually separated semiconductor device to cover the exposed surface at a peripheral end portion of that surface of the semiconductor device which has the electrode layer thereon. A semiconductor apparatus can thus be obtained that also allows a semiconductor device with a silicon carbide or similar compound semiconductor substrate to adhere to a sealant resin via large adhesive strength and thus allows the sealant resin to be less crackable, less peelable and the like by thermal stress caused in operation.
Public/Granted literature
- US20150171026A1 SEMICONDUCTOR APPARATUS AND METHOD FOR PRODUCING THE SAME Public/Granted day:2015-06-18
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