Invention Grant
- Patent Title: Semiconductor device with recombination region
- Patent Title (中): 具有复合区域的半导体器件
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Application No.: US14102955Application Date: 2013-12-11
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Publication No.: US09543389B2Publication Date: 2017-01-10
- Inventor: Johannes Georg Laven , Roman Baburske , Peter Kanschat
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/96
- IPC: H01L29/96 ; H01L29/10 ; H01L29/739 ; H01L29/78 ; H01L29/861 ; H01L29/423 ; H01L29/04 ; H01L29/06 ; H01L29/40 ; H01L29/417

Abstract:
A semiconductor device includes a drift zone in a semiconductor body. A charge-carrier transfer region forms a pn junction with the drift zone in the semiconductor body. A control structure electrically connects a recombination region to the drift zone during a desaturation cycle and disconnects the recombination region from the drift zone outside the desaturation cycle. During the desaturation cycle the recombination region reduces a charge carrier plasma in the drift zone and reduces reverse recovery losses without adversely affecting blocking characteristics.
Public/Granted literature
- US20150162407A1 Semiconductor Device with Recombination Region Public/Granted day:2015-06-11
Information query
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