Invention Grant
- Patent Title: High electron mobility transistor having reduced threshold voltage variation and method of manufacturing the same
- Patent Title (中): 具有降低的阈值电压变化的高电子迁移率晶体管及其制造方法
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Application No.: US13517815Application Date: 2012-06-14
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Publication No.: US09543391B2Publication Date: 2017-01-10
- Inventor: In-jun Hwang , Jae-joon Oh , Jae-won Lee , Hyo-ji Choi
- Applicant: In-jun Hwang , Jae-joon Oh , Jae-won Lee , Hyo-ji Choi
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2011-0107057 20111019; KR10-2012-0059433 20120601
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/423 ; H01L29/778 ; H01L29/10 ; H01L29/16

Abstract:
According to example embodiments a transistor includes a channel layer on a substrate, a first channel supply layer on the channel, a depletion layer, a second channel supply layer, source and drain electrodes on the first channel supply layer, and a gate electrode on the depletion layer. The channel includes a 2DEG channel configured to generate a two-dimensional electron gas and a depletion area. The first channel supply layer corresponds to the 2DEG channel and defines an opening that exposes the depletion area. The depletion layer is on the depletion area of the channel layer. The second channel supply layer is between the depletion layer and the depletion area.
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