Invention Grant
- Patent Title: Method for forming shield tunnels in single-crystal substrates
- Patent Title (中): 在单晶衬底中形成屏蔽隧道的方法
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Application No.: US15013041Application Date: 2016-02-02
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Publication No.: US09543466B2Publication Date: 2017-01-10
- Inventor: Hiroshi Morikazu
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burnes & Crain Ltd.
- Priority: JP2015-018629 20150202
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00 ; H01L21/78

Abstract:
A method of processing a single-crystal member includes setting the peak energy density of a pulsed laser beam to a value in a range from 1 TW/cm2 to 100 TW/cm2, and applying the pulsed laser beam to the single-crystal member while positioning a converged point of the pulsed laser beam at a predetermined position spaced from an upper side of the single-crystal member to grow a fine hole and a amorphous region shielding the fine hole from the upper side of the single-crystal member, thereby forming a shield tunnel in the single-crystal member.
Public/Granted literature
- US20160225945A1 METHOD OF PROCESSING SINGLE-CRYSTAL MEMBER Public/Granted day:2016-08-04
Information query
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