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US09543468B2 High bandgap III-V alloys for high efficiency optoelectronics 有权
高带隙III-V合金用于高效光电子学

High bandgap III-V alloys for high efficiency optoelectronics
Abstract:
High bandgap alloys for high efficiency optoelectronics are disclosed. An exemplary optoelectronic device may include a substrate, at least one Al1-xInxP layer, and a step-grade buffer between the substrate and at least one Al1-xInxP layer. The buffer may begin with a layer that is substantially lattice matched to GaAs, and may then incrementally increase the lattice constant in each sequential layer until a predetermined lattice constant of Al1-xInxP is reached.
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