Invention Grant
- Patent Title: Epitaxy base and light-emitting device
- Patent Title (中): 外延基座和发光装置
-
Application No.: US14740283Application Date: 2015-06-16
-
Publication No.: US09543483B2Publication Date: 2017-01-10
- Inventor: Kuan-Yung Liao , Yun-Li Li , Chih-Ling Wu , Yen-Lin Lai
- Applicant: PlayNitride Inc.
- Applicant Address: TW Tainan
- Assignee: PlayNitride Inc.
- Current Assignee: PlayNitride Inc.
- Current Assignee Address: TW Tainan
- Agency: Jianq Chyun IP Office
- Priority: TW103122875 20140702
- Main IPC: H01L33/50
- IPC: H01L33/50 ; F21K99/00 ; F21V9/16 ; H01L33/44 ; H01L33/08 ; H01L33/00 ; H01L21/02

Abstract:
An epitaxy base adapted to form a light-emitting device on is provided. The epitaxy base includes a substrate and a patterned wavelength conversion structure disposed on a part of the substrate and protruding out from the substrate. A light-emitting device including the epitaxy base, a first type semiconductor layer, an emitting layer and a second type semiconductor layer is provided. The first type semiconductor layer is disposed on the substrate and the patterned wavelength conversion structure. The emitting layer is disposed on the first type semiconductor layer. The second type semiconductor layer is disposed on the emitting layer.
Public/Granted literature
- US20160005935A1 EPITAXY BASE AND LIGHT-EMITTING DEVICE Public/Granted day:2016-01-07
Information query
IPC分类: