Invention Grant
- Patent Title: Compositions and methods for selectively etching titanium nitride
- Patent Title (中): 用于选择性蚀刻氮化钛的组合物和方法
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Application No.: US14368714Application Date: 2012-12-27
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Publication No.: US09546321B2Publication Date: 2017-01-17
- Inventor: Jeffrey A. Barnes , Emanuel I. Cooper , Li-Min Chen , Steven Lippy , Rekha Rajaram , Sheng-Hung Tu
- Applicant: Jeffrey A. Barnes , Emanuel I. Cooper , Li-Min Chen , Steven Lippy , Rekha Rajaram , Sheng-Hung Tu
- Applicant Address: US CT Danbury
- Assignee: ADVANCED TECHNOLOGY MATERIALS, INC.
- Current Assignee: ADVANCED TECHNOLOGY MATERIALS, INC.
- Current Assignee Address: US CT Danbury
- Agency: Moore & Van Allen, PLLC
- Agent Tristan A. Fuierer; Maggie Chappuis
- International Application: PCT/US2012/071777 WO 20121227
- International Announcement: WO2013/101907 WO 20130704
- Main IPC: H01B13/00
- IPC: H01B13/00 ; C09K13/10 ; H01L21/3213 ; C09K13/00 ; C09K13/06 ; C09K13/08 ; C23F1/02 ; C23F1/30 ; C23F1/40 ; H01L21/02 ; H01L21/311
Abstract:
Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.
Public/Granted literature
- US20150027978A1 COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE Public/Granted day:2015-01-29
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