Invention Grant
US09547231B2 Device and method for making photomask assembly and photodetector device having light-collecting optical microstructure
有权
用于制造光掩模组件的装置和方法以及具有聚光光学微结构的光电检测器件
- Patent Title: Device and method for making photomask assembly and photodetector device having light-collecting optical microstructure
- Patent Title (中): 用于制造光掩模组件的装置和方法以及具有聚光光学微结构的光电检测器件
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Application No.: US14229859Application Date: 2014-03-29
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Publication No.: US09547231B2Publication Date: 2017-01-17
- Inventor: Tak Kui Wang , Laura M. Giovane , Ramana M. V. Murty
- Applicant: Avago Technologies General IP (Singapore) Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
- Current Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
- Current Assignee Address: SG Singapore
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; G03F1/50 ; G03F1/76 ; G03F1/80 ; H01L33/48 ; H01L27/146 ; G02B3/00

Abstract:
An optical mask can be made by providing a transparent mask substrate; depositing a first layer of opaque material, forming an aperture in the first layer; depositing a second layer of transparent material, depositing a third layer of transparent material; patterning the third layer to produce a disc-shaped region, heating the third layer until the disc-shaped region reflows into a lens-shaped region and cross-links, depositing a fourth layer, patterning the fourth layer to produce a cavity extending to the surface of the lens-shaped region, and dry etching the end of the cavity until the second layer develops a shape corresponding to the lens-shaped region.
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