Invention Grant
- Patent Title: Photoresist with rare-earth sensitizers
- Patent Title (中): 光致抗蚀剂与稀土敏化剂
-
Application No.: US14413255Application Date: 2013-02-19
-
Publication No.: US09547238B2Publication Date: 2017-01-17
- Inventor: Eugen Pavel
- Applicant: Eugen Pavel
- Agency: Lucas & Mercanti, LLP
- Agent Jonathan Myers
- Priority: ROA201200733 20121016
- International Application: PCT/RO2013/000003 WO 20130219
- International Announcement: WO2013/119134 WO 20130815
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039 ; G03F7/20 ; B23K26/00 ; G03F7/038
Abstract:
A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.
Public/Granted literature
- US20150132700A1 PHOTORESIST WITH RARE-EARTH SENSITIZERS Public/Granted day:2015-05-14
Information query
IPC分类:
