The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including an optical unit including a plurality of optical systems each of which irradiates the substrate with a beam for forming the pattern and which are arranged in at least one of a first direction and a second direction orthogonal to an optical axis thereof, and a pair of interferometers configured to measure a rotation angle of the optical unit around an axis parallel to the optical axis, wherein a distance between measurement axes of the pair of interferometers is not small than longer one of a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the first direction and a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the second direction.