Invention Grant
- Patent Title: Simultaneous measurement of multiple overlay errors using diffraction based overlay
- Patent Title (中): 使用衍射叠加法同时测量多个重叠误差
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Application No.: US14685494Application Date: 2015-04-13
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Publication No.: US09547244B2Publication Date: 2017-01-17
- Inventor: Jie Li
- Applicant: Nanometrics Incorporated
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Agency: Silicon Valley Patent Group LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/14 ; G03F9/00

Abstract:
A plurality of overlay errors in a structure is determined using a target that includes a plurality of diffraction based overlay pads. Each diffraction based overlay pad has the same number of periodic patterns as the structure under test. Additionally, each diffraction based overlay pad includes a programmed shift between each pair of periodic patterns. The pads are illuminated and the resulting light is detected and used to simultaneously determine the plurality of overlay errors in the structure based on the programmed shifts. The overlay errors may be determined using a subset of elements of the Mueller matrix or by using the resulting spectra from the pads.
Public/Granted literature
- US20150308817A1 SIMULTANEOUS MEASUREMENT OF MULTIPLE OVERLAY ERRORS USING DIFFRACTION BASED OVERLAY Public/Granted day:2015-10-29
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