Invention Grant
US09548350B2 High quality factor capacitors and methods for fabricating high quality factor capacitors 有权
高品质因数电容器和制造高品质因数电容器的方法

High quality factor capacitors and methods for fabricating high quality factor capacitors
Abstract:
Provided are space-efficient capacitors that have a higher quality factor than conventional designs and improve coupling of electrical energy from a through-glass via (TGV) to a dielectric. For example, provided is a TGV having a non-rectangular cross-section, where one end of the TGV is coupled to a first metal plate. A dielectric material is formed on the first metal plate. A second metal plate is formed on the dielectric material in a manner that overlaps at least a portion of the first metal plate to form at least one overlapped region of the dielectric material. At least a part of the perimeter of the overlapped region is non-planar. The overlapped region can be formed in a shape of a closed ring, in a plurality of portions of a ring shape, in substantially a quarter of a ring shape, and/or in substantially a half of a ring shape.
Information query
Patent Agency Ranking
0/0