Invention Grant
- Patent Title: Semiconductor device including field effect transistor
- Patent Title (中): 包括场效应晶体管的半导体器件
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Application No.: US14742710Application Date: 2015-06-18
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Publication No.: US09548390B2Publication Date: 2017-01-17
- Inventor: Jongun Kim , Dong-Hyun Kim , Hyun-Seung Song
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2013-0090277 20130730
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/423 ; H01L29/66 ; H01L27/088 ; H01L29/06 ; H01L29/10 ; H01L29/165

Abstract:
A semiconductor device includes a fin portion protruding from a substrate. The fin portion includes a base part, an intermediate part on the base part, and a channel part on the intermediate part. A width of the intermediate part is less than a width of the base part and greater than a width of the channel part. A gate electrode coves both sidewalls and a top surface of the channel part, and a device isolation pattern covers both sidewalls of the base part and both sidewalls of the intermediate part.
Public/Granted literature
- US20150287829A1 SEMICONDUCTOR DEVICE INCLUDING FIELD EFFECT TRANSISTOR Public/Granted day:2015-10-08
Information query
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