Invention Grant
- Patent Title: Multiple-surface imposition vapor deposition mask
- Patent Title (中): 多表面拼版气相沉积掩模
-
Application No.: US14879386Application Date: 2015-10-09
-
Publication No.: US09548453B2Publication Date: 2017-01-17
- Inventor: Yoshinori Hirobe , Yutaka Matsumoto , Masato Ushikusa , Toshihiko Takeda , Katsunari Obata , Hiroyuki Nishimura
- Applicant: DAI NIPPON PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2012-004488 20120112
- Main IPC: C23C16/04
- IPC: C23C16/04 ; H01L51/00 ; C23C14/24 ; C23C14/04 ; H01L51/56

Abstract:
A method for producing a multiple-surface imposition vapor deposition mask enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
Public/Granted literature
- US20160163983A1 MULTIPLE-SURFACE IMPOSITION VAPOR DEPOSITION MASK Public/Granted day:2016-06-09
Information query
IPC分类: