Invention Grant
- Patent Title: Raised bodied vapor chamber structure
- Patent Title (中): 凸起的蒸气室结构
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Application No.: US13950257Application Date: 2013-07-24
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Publication No.: US09549486B2Publication Date: 2017-01-17
- Inventor: Hsiu-Wei Yang
- Applicant: ASIA VITAL COMPONENTS CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: Asia Vital Components Co., Ltd.
- Current Assignee: Asia Vital Components Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: Nikolai & Mersereau, P.A.
- Agent C. G. Mersereau
- Main IPC: F28D15/00
- IPC: F28D15/00 ; H05K7/20 ; F28D15/04

Abstract:
A raised bodied vapor chamber structure is disclosed and includes a main body and a working fluid. The main body has a condensation section and an evaporation section and a chamber. The condensation section and the evaporation section are respectively disposed on two sides of the chamber. The evaporation section has a first face and a second face. A raised section is formed on the first face. The working fluid is filled in the chamber. The raised section is formed by means of mechanical processing as a support structure for enhancing the structural strength of the vapor chamber structure. The vapor chamber structure is manufactured at a much lower cost.
Public/Granted literature
- US20150027668A1 VAPOR CHAMBER STRUCTURE Public/Granted day:2015-01-29
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