Invention Grant
- Patent Title: Fabrication system and a fabrication method of a light emitting device
- Patent Title (中): 制造系统和发光装置的制造方法
-
Application No.: US12272820Application Date: 2008-11-18
-
Publication No.: US09551063B2Publication Date: 2017-01-24
- Inventor: Shunpei Yamazaki , Masakazu Murakami , Hisashi Ohtani
- Applicant: Shunpei Yamazaki , Masakazu Murakami , Hisashi Ohtani
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2002-047508 20020225
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C14/12 ; C23C14/24 ; C23C14/50
Abstract:
An evaporation apparatus with high utilization efficiency for EL materials and excellent film uniformity is provided. The invention is an evaporation apparatus having a movable evaporation source and a substrate rotating unit, in which the space between an evaporation source holder and a workpiece (substrate) is narrowed to 30 cm or below, preferably 20 cm, more preferably 5 to 15 cm, to improve the utilization efficiency for EL materials. In evaporation, the evaporation source holder is moved in the X-direction or the Y-direction, and the workpiece (substrate) is rotated for deposition. Therefore, film uniformity is improved.
Public/Granted literature
- US20090074952A1 Fabrication System and a Fabrication Method of a Light Emitting Device Public/Granted day:2009-03-19
Information query
IPC分类:
