Invention Grant
- Patent Title: Surface inspection apparatus and method thereof
- Patent Title (中): 表面检查装置及其方法
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Application No.: US14249512Application Date: 2014-04-10
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Publication No.: US09551670B2Publication Date: 2017-01-24
- Inventor: Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: HITACHI, LTD.,HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI, LTD.,HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2000-068593 20000308
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/47 ; G01N21/94 ; G01N21/95

Abstract:
A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
Public/Granted literature
- US20140218723A1 SURFACE INSPECTION APPARATUS AND METHOD THEREOF Public/Granted day:2014-08-07
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