Invention Grant
- Patent Title: Projection apparatus
- Patent Title (中): 投影仪
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Application No.: US13244634Application Date: 2011-09-25
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Publication No.: US09551919B2Publication Date: 2017-01-24
- Inventor: Yu-Po Chen , S-Wei Chen
- Applicant: Yu-Po Chen , S-Wei Chen
- Applicant Address: TW Hisnchu
- Assignee: Young Optics Inc.
- Current Assignee: Young Optics Inc.
- Current Assignee Address: TW Hisnchu
- Agency: Jianq Chyun IP Office
- Priority: TW100111299A 20110331
- Main IPC: G03B21/00
- IPC: G03B21/00 ; G03B21/20 ; G02F1/29 ; G02F1/295 ; G03B21/28 ; G03B33/06

Abstract:
A projection apparatus including a light source, a light valve, a light uniforming device, and a first curved-surface reflection device is provided. The light source provides an illumination beam. The light valve is disposed on a transmission path of the illumination beam for converting the illumination beam into an image beam. The light valve has an active surface that substantially has a rectangular contour. The light uniforming device is disposed on the transmission path of the illumination beam and between the light source and the light valve. The first curved-surface reflection device is disposed on the transmission path of the illumination beam and between the light source and the light valve for reflecting the illumination beam to the light valve. A curvature of the first curved-surface reflection device along a first direction is not equal to a curvature of the first curved-surface reflection device along a second direction.
Public/Granted literature
- US20120249971A1 PROJECTION APPARATUS Public/Granted day:2012-10-04
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