Invention Grant
US09551928B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
有权
光化学射线或辐射敏感性树脂组合物及其形成图案的方法
- Patent Title: Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
- Patent Title (中): 光化学射线或辐射敏感性树脂组合物及其形成图案的方法
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Application No.: US12754441Application Date: 2010-04-05
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Publication No.: US09551928B2Publication Date: 2017-01-24
- Inventor: Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
- Applicant: Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-092418 20090406; JP2009-201948 20090901
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; C07C303/32 ; C07C309/14 ; C07C309/00 ; C07C309/10 ; C07C309/17 ; C07C309/42 ; C07C311/09 ; C07C311/48 ; C07C381/12 ; C07D333/46 ; C07D333/76 ; G03F7/039 ; G03F7/20
Abstract:
According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n≧1, m≧2 and n
Public/Granted literature
- US20100255418A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH Public/Granted day:2010-10-07
Information query
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