Invention Grant
US09551936B2 Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
有权
用于光刻胶冲洗溶液的全氟烷基磺酰胺表面活性剂
- Patent Title: Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
- Patent Title (中): 用于光刻胶冲洗溶液的全氟烷基磺酰胺表面活性剂
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Application No.: US14237193Application Date: 2012-08-01
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Publication No.: US09551936B2Publication Date: 2017-01-24
- Inventor: Jason M. Kehren , Patricia M. Savu , Matthew J. Pinnow
- Applicant: Jason M. Kehren , Patricia M. Savu , Matthew J. Pinnow
- Applicant Address: US MN St. Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN St. Paul
- Agent Adam Bramwell
- International Application: PCT/US2012/049158 WO 20120801
- International Announcement: WO2013/022673 WO 20130214
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/40 ; H01L21/027
Abstract:
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.
Public/Granted literature
- US20140154632A1 PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS Public/Granted day:2014-06-05
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