Invention Grant
- Patent Title: Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method
- Patent Title (中): 光源优化方法，曝光方法，装置制造方法，程序，曝光装置，光刻系统，光源评估方法和光源调制方法
-
Application No.: US13366829Application Date: 2012-02-06
-
Publication No.: US09551938B2Publication Date: 2017-01-24
- Inventor: Tomoyuki Matsuyama , Naonori Kita
- Applicant: Tomoyuki Matsuyama , Naonori Kita
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-035476 20100220
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20
Abstract:
Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.
Public/Granted literature
Information query
