Invention Grant
US09551942B2 Controller for optical device, exposure method and apparatus, and method for manufacturing device
有权
用于光学装置的控制器，曝光方法和装置以及制造装置的方法
- Patent Title: Controller for optical device, exposure method and apparatus, and method for manufacturing device
- Patent Title (中): 用于光学装置的控制器，曝光方法和装置以及制造装置的方法
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Application No.: US14991667Application Date: 2016-01-08
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Publication No.: US09551942B2Publication Date: 2017-01-24
- Inventor: Soichi Owa
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2007-289090 20071106
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.
Public/Granted literature
- US20160124314A1 CONTROLLER FOR OPTICAL DEVICE, EXPOSURE METHOD AND APPARATUS, AND METHOD FOR MANUFACTURING DEVICE Public/Granted day:2016-05-05
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