Invention Grant
- Patent Title: Processing method of substrate and manufacturing method of liquid ejection head
- Patent Title (中): 基板的加工方法和液体喷头的制造方法
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Application No.: US14963493Application Date: 2015-12-09
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Publication No.: US09552984B2Publication Date: 2017-01-24
- Inventor: Atsushi Hiramoto , Atsunori Terasaki , Ryoji Kanri
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2014-256176 20141218
- Main IPC: H01L23/12
- IPC: H01L23/12 ; H01L21/02 ; B41J2/14 ; B41J2/16

Abstract:
There are provided a processing method of a substrate in which in forming a trench on the substrate by etching, a side wall surrounding the trench is surely protected, and a manufacturing method of a liquid ejection head. The methods include: repeating sequentially a plurality of cycles of a trench forming step of forming the trench on a printing element substrate, a first protection layer forming step of forming a passivation layer, and a first protection layer removing step of removing a portion at which the trench is excavated in the passivation layer. A second protection layer forming step and a second protection layer removing step are performed between the trench forming step through the first protection layer removing step repeated in a plurality of cycles and the trench forming step through the first protection layer removing step repeated next.
Public/Granted literature
- US20160176193A1 PROCESSING METHOD OF SUBSTRATE AND MANUFACTURING METHOD OF LIQUID EJECTION HEAD Public/Granted day:2016-06-23
Information query
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