Invention Grant
- Patent Title: Capacitor and method for making same
- Patent Title (中): 电容器及其制作方法
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Application No.: US14103307Application Date: 2013-12-11
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Publication No.: US09553095B2Publication Date: 2017-01-24
- Inventor: Kuo-Chi Tu , Wen-Chuan Chiang , Chen-Jong Wang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L23/522 ; H01L27/105 ; H01L27/11 ; H01L49/02

Abstract:
A system-on-chip (SOC) device comprises a first capacitor in a first region, a second capacitor in a second region, and may further comprise a third capacitor in a third region, and any additional number of capacitors in additional regions. The capacitors may be of different shapes and sizes. A region may comprise more than one capacitor. Each capacitor in a region has a top electrode, a bottom electrode, and a capacitor insulator. The top electrodes of all the capacitors are formed in a common process, while the bottom electrodes of all the capacitors are formed in a common process. The capacitor insulator may have different number of sub-layers, formed with different materials or different thickness. The capacitors may be formed in an inter-layer dielectric layer or in an inter-metal dielectric layer. The regions may be a mixed signal region, an analog region, a radio frequency region, a dynamic random access memory region, and so forth.
Public/Granted literature
- US20140091426A1 Capacitor and Method for Making Same Public/Granted day:2014-04-03
Information query
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