Invention Grant
- Patent Title: Gate stack for normally-off compound semiconductor transistor
- Patent Title (中): 用于常闭复合半导体晶体管的栅极堆叠
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Application No.: US13921630Application Date: 2013-06-19
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Publication No.: US09553183B2Publication Date: 2017-01-24
- Inventor: Gilberto Curatola
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/205 ; H01L29/66

Abstract:
A normally-off compound semiconductor transistor includes a heterostructure body and a gate stack on the heterostructure body. The heterostructure body includes a source, a drain spaced apart from the source, and a channel for connecting the source and the drain. The channel includes a first two-dimensional charge carrier gas of a first polarity arising in the heterostructure body due to piezoelectric effects. The gate stack controls the channel in a region of the heterostructure body under the gate stack. The gate stack includes at least one III-nitride material which gives rise to a second two-dimensional charge carrier gas of a second polarity opposite the first polarity in the gate stack or in the heterostructure body under the gate stack due to piezoelectric effects. The second two-dimensional charge carrier gas counter-balances polarization charges in the first two-dimensional charge carrier gas so that the channel is disrupted under the gate stack.
Public/Granted literature
- US20140374765A1 Gate Stack for Normally-Off Compound Semiconductor Transistor Public/Granted day:2014-12-25
Information query
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