Invention Grant
US09553266B2 Process of structuring an active organic layer deposited on a substrate
有权
构建沉积在基底上的活性有机层的方法
- Patent Title: Process of structuring an active organic layer deposited on a substrate
- Patent Title (中): 构建沉积在基底上的活性有机层的方法
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Application No.: US14220261Application Date: 2014-03-20
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Publication No.: US09553266B2Publication Date: 2017-01-24
- Inventor: Marie Heitzmann , Simon Charlot
- Applicant: Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Current Assignee: Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Current Assignee Address: FR Paris
- Agency: Burr & Brown, PLLC
- Priority: FR1158776 20110930
- Main IPC: H01L51/00
- IPC: H01L51/00
Abstract:
A method of structuring an active organic layer deposited on a substrate, including depositing a sacrificial layer on the substrate by photolithography, the sacrificial layer being made of at least one resist, creating at least one pattern inside of the sacrificial layer, depositing an active organic layer on the sacrificial layer and in the pattern, depositing a protective layer made of organic polymer on the active layer and in the pattern of the resist sacrificial layer, removing the sacrificial layer by projection of a solvent on the resin forming the layer, and removing the protective layer by dissolving the polymer forming it in a solvent.
Public/Granted literature
- US20140235013A1 PROCESS OF STRUCTURING AN ACTIVE ORGANIC LAYER DEPOSITED ON A SUBSTRATE Public/Granted day:2014-08-21
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