Invention Grant
- Patent Title: Optical pattern projection
- Patent Title (中): 光学图案投影
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Application No.: US14955066Application Date: 2015-12-01
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Publication No.: US09554122B2Publication Date: 2017-01-24
- Inventor: Alexander Shpunt , Benny Pesach
- Applicant: APPLE INC.
- Applicant Address: US CA Cupertino
- Assignee: APPLE INC.
- Current Assignee: APPLE INC.
- Current Assignee Address: US CA Cupertino
- Agency: D.Kligler IP Services Ltd.
- Main IPC: G02B5/18
- IPC: G02B5/18 ; H04N13/02 ; G01B11/25 ; G02B27/00 ; G02B27/09 ; G02B27/42 ; G03B35/00 ; G06K9/20 ; G02B27/10

Abstract:
Optical apparatus includes first and second diffractive optical elements (DOEs) arranged in series to diffract an input beam of radiation. The first DOE is configured to apply to the input beam a pattern with a specified divergence angle, while the second DOE is configured to split the input beam into a matrix of output beams with a specified fan-out angle. The divergence and fan-out angles are chosen so as to project the radiation onto a region in space in multiple adjacent instances of the pattern.
Public/Granted literature
- US20160100155A1 Optical pattern projection Public/Granted day:2016-04-07
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