Invention Grant
- Patent Title: Integrated apertured micromirror and applications thereof
- Patent Title (中): 集成多孔微镜及其应用
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Application No.: US14210904Application Date: 2014-03-14
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Publication No.: US09557556B2Publication Date: 2017-01-31
- Inventor: Yasser M. Sabry , Diaa Abdel Maged Khalil , Mohamed Sadek
- Applicant: Si-Ware Systems
- Applicant Address: EG Cairo
- Assignee: SI-WARE SYSTEMS
- Current Assignee: SI-WARE SYSTEMS
- Current Assignee Address: EG Cairo
- Agency: Loza & Loza, LLP
- Agent Holly L. Rudnick
- Main IPC: G02B6/24
- IPC: G02B6/24 ; G02B26/00 ; G01B9/02 ; G01J1/04 ; G02B6/35 ; G02B26/02 ; G02B6/36 ; G02B6/26 ; G02B6/293 ; B81B5/00 ; G02B1/00

Abstract:
An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.
Public/Granted literature
- US20140268174A1 Integrated Apertured Micromirror and Applications Thereof Public/Granted day:2014-09-18
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