Invention Grant
US09562122B2 Compound, resin, resist composition and method for producing resist pattern
有权
化合物，树脂，抗蚀剂组合物和抗蚀剂图案的制造方法
- Patent Title: Compound, resin, resist composition and method for producing resist pattern
- Patent Title (中): 化合物，树脂，抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US14835054Application Date: 2015-08-25
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Publication No.: US09562122B2Publication Date: 2017-02-07
- Inventor: Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-170796 20140825
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; C07C69/653 ; C07C69/74 ; C08F220/22 ; C08F220/24 ; C08F120/22 ; C07C233/14 ; C08F220/18 ; G03F7/039
Abstract:
A resist composition has a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator. wherein R1 in each occurrence independently represents a fluorine atom or a C1 to C6 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site.
Public/Granted literature
- US20160053032A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-02-25
Information query
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