Invention Grant
- Patent Title: Process for forming low halogen content polyarylene sulfides
- Patent Title (中): 用于形成低卤素聚亚芳基硫化物的方法
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Application No.: US14481310Application Date: 2014-09-09
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Publication No.: US09562139B2Publication Date: 2017-02-07
- Inventor: Hendrich Alvarez Chiong
- Applicant: Ticona LLC
- Applicant Address: US KY Florence
- Assignee: Ticona LLC
- Current Assignee: Ticona LLC
- Current Assignee Address: US KY Florence
- Agency: Dority & Manning, P.A.
- Main IPC: C08G75/14
- IPC: C08G75/14 ; C08G75/00

Abstract:
A multi-stage process and system for formation of a polyarylene sulfide is described. A first polymerization stage of the formation process can include reaction of a sulfide monomer with a dihaloaromatic monomer to form a prepolymer. A second polymerization stage can include further polymerization of the prepolymer with a sulfur-containing monomer and a dihaloaromatic monomer to form a low halogen content polyarylene sulfide. The amount of sulfur utilized in the second polymerization stage is a low fraction of the total amount of sulfur utilized in the multi-stage process.
Public/Granted literature
- US20150087777A1 PROCESS FOR FORMING LOW HALOGEN CONTENT POLYARYLENE SULFIDES Public/Granted day:2015-03-26
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