Invention Grant
- Patent Title: Transparent conductive film and production method therefor
- Patent Title (中): 透明导电膜及其制备方法
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Application No.: US14761195Application Date: 2014-01-14
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Publication No.: US09562282B2Publication Date: 2017-02-07
- Inventor: Kazuaki Sasa , Yusuke Yamamoto , Hironobu Machinaga
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Osaka
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-005499 20130116
- International Application: PCT/JP2014/050464 WO 20140114
- International Announcement: WO2014/112481 WO 20140724
- Main IPC: B32B15/08
- IPC: B32B15/08 ; C23C14/08 ; C23C14/58 ; C23C14/35 ; H01L31/18

Abstract:
A transparent conductive film includes a transparent conductive coating provided on at least one surface of an organic polymer film substrate, wherein the transparent conductive coating is a crystalline coating of an indium-based complex oxide having a content of a tetravalent metal element oxide of 7 to 15% by weight calculated by the formula {(the amount of the tetravalent metal element oxide)/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}=100(%), has a thickness in the range of more than 40 to 200 nm, a specific resistance of 1.2×10−4 to 2.0×10−4 Ω·cm, main X-ray diffraction peaks corresponding to (222) and (440) planes and has a ratio (I440/I222) of (440) peak intensity (I440) to (222) peak intensity (I222) of less than 0.3, and has an internal stress of 700 MPa or less as determined by an X-ray stress measurement method.
Public/Granted literature
- US20160024640A1 TRANSPARENT CONDUCTIVE FILM AND PRODUCTION METHOD THEREFOR Public/Granted day:2016-01-28
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