Invention Grant
- Patent Title: Production method for silicon nanoparticles
- Patent Title (中): 硅纳米粒子的生产方法
-
Application No.: US13882816Application Date: 2011-10-18
-
Publication No.: US09562296B2Publication Date: 2017-02-07
- Inventor: Yasuhiko Ito , Manabu Tokushige , Tokujiro Nishikiori , Hiroyuki Tsujimura
- Applicant: Yasuhiko Ito , Manabu Tokushige , Tokujiro Nishikiori , Hiroyuki Tsujimura
- Applicant Address: JP Kyoto-shi, Kyoto
- Assignee: I'MSEP CO., LTD.
- Current Assignee: I'MSEP CO., LTD.
- Current Assignee Address: JP Kyoto-shi, Kyoto
- Agency: Millen, White, Zelano and Branigan, P.C.
- Priority: JP2010-246040 20101102
- International Application: PCT/JP2011/073877 WO 20111018
- International Announcement: WO2012/060208 WO 20120510
- Main IPC: C25C5/04
- IPC: C25C5/04 ; B22F9/20 ; C01B33/023 ; B82Y30/00
Abstract:
Provided is a method for producing fine metal particles, wherein metal oxide powders can be used as a source of fine metal particles, and a method for producing fine metal particles can be provided avoiding the contamination of the molten salt electrolyte bath and the produced fine metal particles. A method for producing fine metal particles (112) is provided which comprises generating cathodic discharge outside and over the surface of an electrolyte bath (100) comprising metal oxide powders (110) suspended therein, whereby the metal oxide powders (110) are electrochemically reduced into the fine metal particles (112).
Public/Granted literature
- US20130228469A1 PRODUCTION METHOD FOR METAL MICROPARTICLE Public/Granted day:2013-09-05
Information query
