Invention Grant
US09563118B2 Photomask, method of manufacturing photomask and exposure apparatus
有权
光掩模，制造光掩模和曝光装置的方法
- Patent Title: Photomask, method of manufacturing photomask and exposure apparatus
- Patent Title (中): 光掩模，制造光掩模和曝光装置的方法
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Application No.: US14420584Application Date: 2014-01-28
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Publication No.: US09563118B2Publication Date: 2017-02-07
- Inventor: Masahiro Kato
- Applicant: Sakai Display Products Corporation
- Applicant Address: JP Sakai-shi, Osaka
- Assignee: Sakai Display Products Corporation
- Current Assignee: Sakai Display Products Corporation
- Current Assignee Address: JP Sakai-shi, Osaka
- Agency: Bozicevic, Field & Francis LLP
- Agent Rudy J. Ng; Bret E. Field
- Priority: JP2013-022429 20130207
- International Application: PCT/JP2014/051763 WO 20140128
- International Announcement: WO2014/123030 WO 20140814
- Main IPC: G03F1/42
- IPC: G03F1/42 ; G03F1/38 ; G03F7/20
Abstract:
On a photomask used for exposure processing, a plurality of pattern regions on which predetermined patterns are formed using a light shielding material are provided, and calibration marks are formed at positions corresponding to at least two opposite sides of each pattern region. During exposure processing, a deformation state of the photomask is detected based on calibration marks formed on the photomask and marks formed on a substrate stage, and a projection condition for projecting a pattern formed on the photomask on the substrate is corrected based on the detection result.
Public/Granted literature
- US20150219987A1 Photomask, Method of Manufacturing Photomask and Exposure Apparatus Public/Granted day:2015-08-06
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