Invention Grant
US09563123B2 Photoresist composition, compound and process of producing photoresist pattern
有权
光致抗蚀剂组合物，复合物和制造光致抗蚀剂图案的工艺
- Patent Title: Photoresist composition, compound and process of producing photoresist pattern
- Patent Title (中): 光致抗蚀剂组合物，复合物和制造光致抗蚀剂图案的工艺
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Application No.: US14635718Application Date: 2015-03-02
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Publication No.: US09563123B2Publication Date: 2017-02-07
- Inventor: Tatsuro Masuyama , Shingo Fujita , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-040138 20140303
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/38 ; C07D321/10 ; C07C71/00
Abstract:
A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
Public/Granted literature
- US20150248052A1 PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN Public/Granted day:2015-09-03
Information query
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