Invention Grant
- Patent Title: Photoresist composition and method for producing photoresist pattern
- Patent Title (中): 光致抗蚀剂组合物及其制造方法
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Application No.: US13949700Application Date: 2013-07-24
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Publication No.: US09563124B2Publication Date: 2017-02-07
- Inventor: Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-166681 20120727
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; G03F7/039 ; G03F7/20
Abstract:
A photoresist composition comprising a resin which has no acid-labile group and which comprises a structural unit represented by formula (I); and a structural unit represented by formula (a4); a resin which has an acid-labile group; and an acid generator.
Public/Granted literature
- US20140030654A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2014-01-30
Information query
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