Invention Grant
US09563129B2 Monitor system for determining orientations of mirror elements and EUV lithography system
有权
用于确定镜元件和EUV光刻系统的方向的监视器系统
- Patent Title: Monitor system for determining orientations of mirror elements and EUV lithography system
- Patent Title (中): 用于确定镜元件和EUV光刻系统的方向的监视器系统
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Application No.: US14665420Application Date: 2015-03-23
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Publication No.: US09563129B2Publication Date: 2017-02-07
- Inventor: Johannes Wangler , Johannes Eisenmenger , Markus Deguenther , Michael Patra
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102012218221 20121005
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G02B26/08 ; G01B11/14 ; G01M11/00
Abstract:
An EUV lithography system has an EUV beam path and a monitor beam path. The EUV beam path includes a mirror system having plurality of mirror elements, the orientations of which can be changed. The monitor beam path includes a monitor radiation source, a screen and a spatially resolving detector. The mirror system is arranged in the monitor beam path between the monitor radiation source and the screen.
Public/Granted literature
- US20150198894A1 MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND EUV LITHOGRAPHY SYSTEM Public/Granted day:2015-07-16
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