Invention Grant
- Patent Title: Optical system illuminating surface to be illuminated, exposure apparatus, imprint apparatus, method for manufacturing article, optical element, and method for manufacturing optical system
- Patent Title (中): 要照明的光学系统照明面,曝光装置,压印装置,制品制造方法,光学元件以及制造光学系统的方法
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Application No.: US14558555Application Date: 2014-12-02
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Publication No.: US09563134B2Publication Date: 2017-02-07
- Inventor: Nobuyuki Saito
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2013-250399 20131203
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72 ; G03F7/20 ; G03F7/00

Abstract:
An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.
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