Invention Grant
US09563221B2 Semiconductor device and method for setting voltage in semiconductor device
有权
用于设置半导体器件中的电压的半导体器件和方法
- Patent Title: Semiconductor device and method for setting voltage in semiconductor device
- Patent Title (中): 用于设置半导体器件中的电压的半导体器件和方法
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Application No.: US15059741Application Date: 2016-03-03
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Publication No.: US09563221B2Publication Date: 2017-02-07
- Inventor: Makoto Suwada
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Staas & Halsey LLP
- Priority: JP2015-074989 20150401
- Main IPC: G11C5/14
- IPC: G11C5/14 ; G05F3/16 ; H01L23/498

Abstract:
A semiconductor device includes a substrate; a first through-electrode penetrating the substrate and connected to a power source or a reference potential point; a second through-electrode penetrating the substrate; a power section connected between the substrate and the second through-electrode and configured to output a DC voltage between the substrate and the second through-electrode; a voltage control section configured to control the DC voltage to be output by the power section; and a measurement section connected to the first through-electrode and configured to measure a power impedance of the first through-electrode, wherein the voltage control section is configured to control a value of the DC voltage output by the power section, such that the power impedance of the first through-electrode measured by the measurement section is equal to or less than a predetermined value within a predetermined frequency range including a frequency of noise occurring in the first through-electrode.
Public/Granted literature
- US20160291628A1 SEMICONDUCTOR DEVICE AND METHOD FOR SETTING VOLTAGE IN SEMICONDUCTOR DEVICE Public/Granted day:2016-10-06
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