Invention Grant
- Patent Title: Pillar-type field effect transistor having low leakage current
- Patent Title (中): 柱型场效应晶体管具有低漏电流
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Application No.: US13010360Application Date: 2011-01-20
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Publication No.: US09564200B2Publication Date: 2017-02-07
- Inventor: Jong-Ho Lee
- Applicant: Jong-Ho Lee
- Applicant Address: KR Seoul
- Assignee: SNU R&DB FOUNDATION
- Current Assignee: SNU R&DB FOUNDATION
- Current Assignee Address: KR Seoul
- Agency: Cantor Colburn LLP
- Priority: KR10-2007-0035277 20070410
- Main IPC: H01L29/66
- IPC: H01L29/66 ; G11C11/403 ; H01L27/108 ; H01L29/423 ; H01L29/78 ; H01L29/786

Abstract:
A pillar-type field effect transistor having low leakage current is provided. The pillar-type field effect transistor includes: a semiconductor body, source and drain formed in a semiconductor pillar; a gate insulating layer formed on a surface of the semiconductor body; a gate electrode formed on a surface of the gate insulating layer. The gate electrode includes a first gate electrode and a second gate electrode being electrically connected with the first gate electrode. The first gate electrode has a work function higher than that of the second gate electrode. Accordingly, the gate induced drain leakage (GIDL) can be reduced, so that an off-state leakage current can be greatly reduced.
Public/Granted literature
- US20110121396A1 PILLAR-TYPE FIELD EFFECT TRANSISTOR HAVING LOW LEAKAGE CURRENT Public/Granted day:2011-05-26
Information query
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