Invention Grant
US09564449B2 Semiconductor device and method of forming a semiconductor device 有权
半导体装置及其制造方法

Semiconductor device and method of forming a semiconductor device
Abstract:
A semiconductor device is provided, which may include: a well of a first conductivity type located within a substrate of a second conductivity type; a well terminal electrically coupled to the well; a floating gate disposed over the well; a floating gate terminal electrically coupled to the floating gate; a control gate disposed over the floating gate and electrically coupled to the well; and a control gate terminal electrically coupled to the control gate; wherein the floating gate terminal is configured to receive a first voltage; wherein the control gate terminal and the well terminal are configured to receive a second voltage.
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