Invention Grant
US09564552B2 Method for producing group III nitride semiconductor light-emitting device
有权
III族氮化物半导体发光元件的制造方法
- Patent Title: Method for producing group III nitride semiconductor light-emitting device
- Patent Title (中): III族氮化物半导体发光元件的制造方法
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Application No.: US14606696Application Date: 2015-01-27
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Publication No.: US09564552B2Publication Date: 2017-02-07
- Inventor: Ryo Nakamura , Kengo Nagata
- Applicant: TOYODA GOSEI CO., LTD.
- Applicant Address: JP Kiyosu-Shi, Aichi-Ken
- Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee Address: JP Kiyosu-Shi, Aichi-Ken
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2014-029972 20140219
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00 ; H01L33/06 ; H01L33/32 ; H01L33/12 ; H01L33/22 ; H01L33/42

Abstract:
The present invention provides a Group III nitride semiconductor light-emitting device exhibiting improved emission performance. In a MQW structure light-emitting layer in which a plurality of layer units is repeatedly deposited, each layer unit comprising an InGaN well layer, a GaN protective layer, and an AlGaN barrier layer sequentially deposited, the protective layer is formed as follows. The protective layer is grown at the same temperature as employed for the well layer. The growth rate of the protective layer is larger than 0.5 times and not larger than 1.1 times the growth rate of the well layer. The protective layer is formed so as to have a thickness of 5 Å to 8 Å at the start of growth of the barrier layer being formed thereafter.
Public/Granted literature
- US20160293792A1 METHOD FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2016-10-06
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