Invention Grant
- Patent Title: Embedded trace substrate and method of forming the same
- Patent Title (中): 嵌入式微量基板及其形成方法
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Application No.: US14602233Application Date: 2015-01-21
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Publication No.: US09565774B2Publication Date: 2017-02-07
- Inventor: Ah Ron Lee
- Applicant: Amkor Technology, Inc.
- Applicant Address: US AZ Tempe
- Assignee: Amkor Technology, Inc.
- Current Assignee: Amkor Technology, Inc.
- Current Assignee Address: US AZ Tempe
- Agent Kevin B. Jackson
- Priority: KR10-2014-0007915 20140122
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K3/40 ; H05K3/00 ; H05K3/06 ; H05K1/11

Abstract:
In one embodiment, a method for forming an embedded trace substrate includes forming a conductive layer on a carrier. A dielectric film is provided on the conductive layer. Vias are formed in the dielectric film and extend to portions of the conductive layer. A conductive pattern is formed on the dielectric layer and is electrically connected to the conductive layer through the vias. The carrier is removed and portions of the conductive layer are selectively removed to provide a plurality of bumps pads configured to protrude outwardly from the dielectric layer.
Public/Granted literature
- US20150208517A1 EMBEDDED TRACE SUBSTRATE AND METHOD OF FORMING THE SAME Public/Granted day:2015-07-23
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