Invention Grant
- Patent Title: Polishing composition and method for producing polished article
- Patent Title (中): 抛光组合物和抛光制品的制造方法
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Application No.: US14769377Application Date: 2014-02-14
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Publication No.: US09566685B2Publication Date: 2017-02-14
- Inventor: Kohsuke Tsuchiya , Hisanori Tansho
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu-Shi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu-Shi
- Agency: Foley & Lardner LLP
- Priority: JP2013-032464 20130221
- International Application: PCT/JP2014/053540 WO 20140214
- International Announcement: WO2014/129408 WO 20140828
- Main IPC: B24B37/04
- IPC: B24B37/04 ; H01L21/02 ; C09K3/14 ; C09G1/02 ; H01L21/306
Abstract:
This invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The water-soluble polymer comprises a polymer A having an adsorption ratio of lower than 5% and a polymer B having an adsorption ratio of 5% or higher, but lower than 95% based on a prescribed adsorption ratio measurement. Herein, the polymer B is selected from polymers excluding hydroxyethyl celluloses.
Public/Granted literature
- US20160001416A1 POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE Public/Granted day:2016-01-07
Information query
