Invention Grant
- Patent Title: Gas system for compressing a process gas
- Patent Title (中): 用于压缩工艺气体的气体系统
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Application No.: US13980338Application Date: 2012-01-26
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Publication No.: US09568014B2Publication Date: 2017-02-14
- Inventor: Ludger Alfes , Klaus Eisele , Thomas Mönk , Markus Reinhold , Axel Spanel
- Applicant: Ludger Alfes , Klaus Eisele , Thomas Mönk , Markus Reinhold , Axel Spanel
- Applicant Address: DE München
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee Address: DE München
- Priority: DE102011003173 20110126
- International Application: PCT/EP2012/051214 WO 20120126
- International Announcement: WO2012/101208 WO 20120802
- Main IPC: F01D1/12
- IPC: F01D1/12 ; F04D29/08 ; F04D17/12 ; F04D29/10 ; F16J15/40 ; B01D53/14

Abstract:
A gas system has a first compressor stage for compressing a process gas. The first compressor stage includes an intake side and a pressure side. A seal gas is provided outside the first compressor stage in order to prevent process gas from issuing from leaks in the first compressor stage, having at least one second line for returning a gas mixture issuing from the gas system, this mixture including at least of process gas and seal gas. The at least one second line is configured for returning the issuing gas mixture to the intake side of the first compressor stage and/or to a location in the gas system upstream of the first compressor stage.
Public/Granted literature
- US20140050569A1 GAS SYSTEM FOR COMPRESSING A PROCESS GAS Public/Granted day:2014-02-20
Information query
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