Invention Grant
US09568824B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
有权
光化学射线或辐射敏感性树脂组合物，抗蚀剂膜及其形成图案的方法
- Patent Title: Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
- Patent Title (中): 光化学射线或辐射敏感性树脂组合物，抗蚀剂膜及其形成图案的方法
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Application No.: US13193235Application Date: 2011-07-28
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Publication No.: US09568824B2Publication Date: 2017-02-14
- Inventor: Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
- Applicant: Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-171085 20100729
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; G03F7/075 ; G03F7/20 ; G03F7/30 ; G03F7/32
Abstract:
Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.
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